离子源

OIS-ES

Electron Source

Its high current density is remarkably effective at increasing plasma density and preventing the plasma process from charge-up.

Long time stability and less contamination in the oxygen process achieved by RF excitation. Two sources can be controlled simultaneously.

Specifications

Neutralizer	RFN-3A
Emission	3000mA
Max RF Power	150W
Controller	OIS-ESC
Neutralizer DC	OISN-Ⅱ
Neutralizer RF	AX300Ⅲ (300W)