NSC-15

NSC-15, an optical thin film sputtering coater for mass-product, employs metal-mode-sputtering technique combined with a highly reactive plasma source. Load-lock system is equipped to achieve high throughput production.

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4 kinds of target materials at maximum

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Replacement of cathode with other component

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Dual rotary cylindrical cathod for stable discharge

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High reactive plasma source for low absorption film

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Load-lock type substrate holder transfer system

Specifications

Vacuum Chamber	LL Room: SUS304, W500 mm×D800 mm×H2890 mm PR Room: SUS304, φ1650 mm×H1200 mm
Substrate Holder	Selectable 13 - 22 pcs a holder
Rotary substrate drum system	φ1500 mm, Drum Type, 10 rpm - 100 rpm (Variable)
Reaction source	ICP (Inductively coupled plasma)
Sputtering source	Dual rotary cathode (Planner type as option)
Evacuation system	Roughing pump, Turbo molecular pump

Performance

Ultimate Pressure	LL chamber: 10 Pa PR chamber: ≤5.0 × 10^-4 Pa
Pump Down Rate	LL chamber: ≤20 min (from atmospheric to 1.0×10^-1 Pa) PR chamber: ≤40 min (from atmospheric to 5.0×10^-3 Pa)
Setting substrate heating temperature	150℃ as option

Utility Requirements

Layout Dimensions	5800 mm (W) × 7700 mm (D)×3200 mm (H)
Power Requirements	3-phase, 380V ± 10％、130kVA、50/60Hz
Cooling Water Flow Rate	180ℓ/min or greater
Compressed Air Pressure	0.5 MPa - 0.7 MPa
Gross Weight	13000 kg approx.