Optical Thin Film Sputtering Coater

NSC-2350

NSC-2350 is metal mode sputter for optical thin film and,especially,optimal system for large area substrates.
The AR+AS film for panels ob mobile terminal device,automobile,ect.

特長
Large coating area:H1100mm × W450 mm at max
6 Cathodes at Maximu
Replacement of cathode with optional component
High reactive plasma source for low absorption film
Load-lock type substrate holder transfer system
Low particle film by opimizing deposition and transfer systems
AR/AS Coating By One Process

Specifications

Vacuum Chamber LL Room: SUS304, W700 mm×H1860 mm×D17600 mm
UL Room: W700×H1860×D1760mm
TR Room:W660×H1860×D1760mm
PR Room:SUS304,φ2350×H1950mm
Substrate Holder Selectable 15 - 22 pcs
Rotary substrate drum system φ2245 mm, Drum Type, 10 rpm - 50 rpm (Tunable)
Reaction source ICP (Inductively coupled plasma)
Sputtering source Dual Rotary cathode (Planner type as option)
Evacuation system Roughing pump, Turbo molecular pump,Meissner chiller
 

Performance

Ultimate Pressure LL Room: 10 Pa
PR chamber: ≤2.0 × 10-4 Pa
Pump Down Rate LL Room: ≤8 min (from atmospheric to 10 Pa)
PR Room: ≤40 min (from atmospheric to 9.0×10-4 Pa)
 

Utility Requirements

Installation Space 7000 mm (W)×6600 mm (D)×4000 mm (H)
Electricity 3-phase+G, 380V ± 5%、300kVA、50/60Hz
Min.Water Flow Rate 400ℓ/min or greater(Pressure:0.6-0.7 Mpa)
Compressed Air Pressure 0.5 MPa - 0.7 MPa
Gross Weight 30000 kg approx.
 

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