Products
OAS　Sputtering system

The OAS-400 is a single-wafer sputter deposition system equipped with a load lock chamber and transport chamber.

Features

  • Equipped with a DC pulse power supply for film deposition and an RF power supply for substrate bias, enabling piezoelectric film deposition.
  • Deposits films on φ8“ wafers (notched) or φ8” substrate trays, and φ6“ wafers (original). Switching between φ8” and φ6" is possible by opening the atmosphere and changing the stage section.
  • Film stress can be controlled by adjusting the substrate heating temperature and the bias power supply output.
OAS Sputter Deposition Equipment

Application fields

  • 電子デバイス（通信デバイス(BAW/SAW)）

    Electronic devices
    (Communication devices (BAW/SAW))

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