Products
OIS　Ion Source

Our proprietary high-performance RF ion source, optimized for ion-assisted deposition.
Suitable for high-rate vacuum deposition and substrate cleaning.

Features

  • Compared to typical ion sources that use consumables such as filaments, it has a longer lifespan and less contamination.
  • It offers high operational stability and can be operated for extended periods.
  • It has high ion distribution uniformity, enabling high current and wide-area irradiation.
OIS Ion Source

Specification

OIS-Two/
OIS-Two Plus		 OIS-Three/
OIS-Three Plus		 OIS-Four OIS-GL
Dimensions φ300mm×H150mm φ390mm×H215mm φ224mm×H143mm φ163mm×H200mm
Grids φ17㎝ φ23cm／26cm φ10cm Gridless
Beam Voltage 100V～1500V 50V-350V
Max Beam Current 1200mA 1800mA/2400mA 500mA 8A
Acc Voltage 100V～1000V
Max RF Power 750W/1000W 2000W 600W
Gas Flow Rate 20sccm-30sccm(argon)
40sccm-60sccm(oxygen)		 10sccm-20sccm(argon)
25sccm-35sccm(oxygen)		 5sccm-50sccm(argon)
10sccm-100sccm(oxygen)
Pressure 5×10⁻²Pa 5×10⁻²Pa 5×10⁻²Pa以下 3.5×10⁻²Pa以下
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