Products
RPD　Reactive Plasma Deposition system

A reactive plasma deposition system capable of mass-producing high-performance LED functional films (ITO/AlN) at low cost.

Features

  • Reactive plasma sources simultaneously achieve evaporation and activation of film deposition materials
  • Forming high-quality crystalline films with appropriate energy
  • Compared to conventional methods, it enables mass production at low temperatures and low cost.
RPD Reactive Plasma Deposition system

Application fields

  • LED

    LED

Specification

RPD-1000 RPD-1300
Vacuum Chamber φ1000mm×H1165mm φ1300mm × H1460mm
Substrate Dome Size φ870mm φ1180mm
Crystal Film Thickness Monitor 6-point Crystal film monitor
Evaporation Source Reactive Plasma Source
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