Reactive Plasma Deposition System

RPD-1000 (ITO/AlN)

The RPD series is a reactive plasma deposition system and can mass-produce high performance, functional LED films (ITO and AlN) at low cost.

Realizing both activation and evaporation of deposition materials by employing a reactive plasma source.
High quality crystalline film by applying optimum energy.
Mass-production at low temperature and low cost.


Chamber Size □ 1000 mm × H1165 mm
Substrate Dome φ 870 mm
Max. Dome Rotation Speed 10 - 30 rpm
Crystal Flim Thicness Monitor 6 point rotary sensor
Ion Source Reactive Plasma Source