Reactive Plasma Deposition System
RPD-1000 (ITO/AlN)
The RPD series is a reactive plasma deposition system and can mass-produce high performance, functional LED films (ITO and AlN) at low cost.
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Realizing both activation and evaporation of deposition materials by employing a reactive plasma source.
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High quality crystalline film by applying optimum energy.
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Mass-production at low temperature and low cost.
Specifications
| Chamber Size | □ 1000 mm × H1165 mm |
| Substrate Dome | φ 870 mm |
| Max. Dome Rotation Speed | 10 - 30 rpm |
| Crystal Flim Thicness Monitor | 6 point rotary sensor |
| Ion Source | Reactive Plasma Source |
