Optical Thin Film Coater for mass production
Gener-1300

Suitable for mass production of AR coating.

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Excellent uniformity by the center drive substrate rotation system.
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Shortened coating tact time achieved by higher performance in pumping and heating.
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Optical monitor, DC ion source, and Resistance heater evaporation source can be optionally installed.
Specifications
Chamber Size | SUS304, φ1300mm×1500mm (H) |
Substrate Dome | Four-sectional Dome (orφ1200mm) |
Max. Dome Rotation Speed | 30 rpm (Variable) |
Crystal Film Thickness Monitor | XTC/3 plus 6-point rotary sensor |
Evaporation Source | One unit of EB source |
Performance
Ultimate Pressure | 7.0 × 10-5 Pa or lower |
Pumping Speed | 10 min (from atmospheric pressure to 3.0×10-3 Pa) |
Max. Substrate Heating Temp. | 350 ℃ |
Utility Requirements
Installation Space | 4500mm (W)×6000mm (D)×3200mm (H) |
Power Source | 3-phase, 200V, 50/60Hz, 80kVA, approx. |
Minimum Water Flow | 100ℓ/min |
Air Pressure | 0.5 - 0.7 MPa |
Weight | 6500kg, approx. |