Optical Thin Film Coater for mass production


Suitable for mass production of AR coating.

Excellent uniformity by the center drive substrate rotation system.
Shortened coating tact time achieved by higher performance in pumping and heating.
Optical monitor, DC ion source, and Resistance heater evaporation source can be optionally installed.


Chamber Size SUS304, φ1300mm×1500mm (H)
Substrate Dome Four-sectional Dome (orφ1200mm)
Max. Dome Rotation Speed 30 rpm (Variable)
Crystal Film Thickness Monitor XTC/3 plus 6-point rotary sensor
Evaporation Source One unit of EB source


Ultimate Pressure 7.0 × 10-5 Pa or lower
Pumping Speed 10 min (from atmospheric pressure to 3.0×10-3 Pa)
Max. Substrate Heating Temp. 350 ℃

Utility Requirements

Installation Space 4500mm (W)×6000mm (D)×3200mm (H)
Power Source 3-phase, 200V, 50/60Hz, 80kVA, approx.
Minimum Water Flow 100ℓ/min
Air Pressure 0.5 - 0.7 MPa
Weight 6500kg, approx.