Ion Source
OIS-One/OIS-Two/OIS-Two Plus
17cm RF Ion Source

Optorun OIS-one/OIS-Two/OIS-Two plus RF ion source are developed for high-rate ion-assisted deposition and substrate ion cleaning, which are installed in Optorun OTFC-1100,
OTFC-1300 and OTFC-1550 coaters for mass production of various optical filters

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Filamentless design. Low contamination and long life.
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High and uniform current beams with broad beam angle.
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Stable, long-hour operation.
Specifications
Model | OIS-One | OIS-Two | OIS-Two Plus |
Dimensions | φ300mm × 150mm (H) | ||
Grids | φ 17cm three molybdenum grids | ||
Beam Voltage | 100V - 1500V | ||
Max Beam Current | 1000mA | 1200mA | |
Acc Voltage | 100V - 1000V | ||
Max RF Power | 600W | 750W | 1000W |
Gas Flow Rate | 20sccm - 30sccm (argon) 40sccm - 60sccm (oxygen) |
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Pressure | 5 × 10-2 Pa | ||
Water-cooling | RF coil and beam unit |
Neutralizer
Dimensions | φ 6cm × 8cm | φ 7cm × 12cm | |
Max Emission Current | 1500mA | 2000mA | 2400mA |
Max RF Power | 150W | ||
Gas Flow Rate | 5sccm to 10sccm (argon only) |