Ion Source
OIS-Three/OIS-Three Plus
RF Ion Source
OIS-Three/OIS-Three Plus has an incomparable high power beam to any other ion beam assisted deposition systems.
Uniform irradiation covers an entire dome with 1600 in diameter.
OIS-Three/OIS-Three Plus is most suitable for mass production of sophisticated optical filters when equipped with OTFC-1800.
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Newly developed grid has long life.
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Long life and less contamination.
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Higher uniformity of ion density with a wide coverage over a dome with 1600mm in diameter.
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Great stability and non-stop operation for longer hours.
Specifications
| Model | OIS-Three | OIS-Three Plus |
| Dimensions | φ 390mm × 215mm(H) | |
| Grids | φ 23cm three molybdenum grids | |
| Beam Voltage | 100V - 1500V | |
| Max Beam Current | 1800mA | 2400mA |
| Acc Voltage | 100V - 1000V | |
| Max RF Power | 2000W | |
| Gas Flow Rate | 20sccm - 40sccm (argon) 40sccm - 80sccm (oxygen) |
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| Pressure | 5 × 10-2 Pa | |
| Water-cooling | RF coil and beam unit | |
Neutralizer
| Dimensions | φ 7cm × 12cm | |
| Max Emission Current (max） | 2800mA | 3000mA |
| Max RF Power | 150W | |
| Gas Flow Rate | 5sccm to 10sccm (argon only) | |
