Optical Wafer Level Sputtering Coater
OWLS-1800
OWLS-1800 is metal-mode sputtering system devoted to "semiconductor optics".The Wafer size appropriate for up to 12inchi.Thesputtering system can expand the scope of application(simultaneous double size coating,low temperature coating.etc.)
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Available for several wafer size(12",10",8",6"and4")
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Fast and clean transfer system by wafer-handling tobot in vacuum
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3 Dual rotary cylindrical cathod at max
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High reactive plasma source for low absorption film
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Other module such as optical thickness monitor (in option)
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Available for EFEM and compliant with SEMI standards
Specifications
| Vacuum Chamber | LL Room: W820 mm×H1455 mm×D740 mm TR Room:W1070 mm×H480 mm×D1070 mm PR Room:W2540 mm×H745 mm×D2285 mm |
| Substrate Holder | 10 pcs (Max 12 inchi) |
| Rotary substrate Drum system | φ1800 mm×H48 mm, Turntable type,10 rpm ~ 100 rpm (Tunable) |
| Reaction source | ICP (Inductively coupled plasma) |
| Sputtering source | Dual rotary cathode (Planner type as option) |
| Evacuation system | Roughing pump, Turbo molecular pump,Meissner chiller |
Performance
| Ultimate Pressure | LL Room,TR Room: 10 Pa PR chamber: ≤5.0 × 10-4 Pa |
| Pump Down Rate | LL Room,TR Room: 5 min (From atmospheric to 10 Pa) PR Room: 40 min (From atomospheric to 5.0×10-3 Pa) |
Utility Requirements
| Installation Space | 6500 mm (W)×6000 mm (D)×3400 mm (H) |
| Electricity | 3-phase+G, 380V ± 5％、125kVA、50/60Hz |
| Min.Water Flow Rate | 195ℓ/min or greater |
| Air Pressure | 0.5 MPa - 0.7 MPa |
| Gross Weight | 13500 kg approx. |
