Ion Source


Electron Source

Its high current density is remarkably effective at increasing plasma density and preventing the plasma process from charge-up.

Long time stability and less contamination in the oxygen process achieved by RF excitation. Two sources can be controlled simultaneously.


Neutralizer RFN-3A
Emission 3000mA
Max RF Power 150W
Controller OIS-ESC
Neutralizer DC OISN-Ⅱ
Neutralizer RF AX300Ⅲ (300W)